GB/T 44538-2024 碳基薄膜 椭偏光谱法测定非晶态碳基薄膜的光学性能
GB/T 44538-2024 Carbon based films—Determination of optical properties of amorphous carbon films by spectfoscopic ellipsometry
基本信息
本文件适用于通过离子蒸镀、溅射、电弧沉积、等离子体辅助化学气相沉积、热丝等工艺沉积的非晶碳基薄膜。
本文件不适用于通过金属或硅改性的非晶碳基薄膜,或在薄膜厚度上存在成分/性质梯度的非晶碳基薄膜。
发布历史
-
2024年09月
研制信息
- 起草单位:
- 中国机械总院集团武汉材料保护研究所有限公司、纳狮新材料有限公司、安徽纯源镀膜科技有限公司、中国科学院深圳先进技术研究院、广东电网有限责任公司、广州今泰科技股份有限公司
- 起草人:
- 段海涛、贾丹、曹一莹、张心凤、沈学忠、高明、詹胜鹏、凃杰松、王彦峰、王流火、杨田、陈辉、骆小双、尤锦鸿、易娟、苏东艺
- 出版信息:
- 页数:12页 | 字数:15 千字 | 开本: 大16开
内容描述
ICS
25.220.99
CCS
A29
中华人民共和国国家标准
GB/T44538—2024
碳基薄膜椭偏光谱法测定
非晶态碳基薄膜的光学性能
Carbonbasedfilms—Determinationofopticalpropertiesofamorphouscarbon
filmsbyspectfoscopicellipsometry
(ISO23216:2021,MOD)
2024-09-29发布2025-05-01实施
国家市场监督管理总局
发布
国家标准化管理委员会
GB/T44538—2024
目次
前言
Ⅲ
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1
范围
1
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2
规范性引用文件
1
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3
术语和定义
1
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4
试样制备
1
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5
设备
1
··································································································
5.1
卤素灯和蓝光LED灯
1
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5.2
探测器
1
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5.3
与光电倍增管(PMT)/电荷耦合器件(CCD)/光电二极管阵列(PDA)连接的光谱仪
2
····
5.4
软件
2
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5.5
置物台
2
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5.6
测角仪
2
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5.7
摄像机
2
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6
试验步骤
2
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6.1
样品预处理
2
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6.2
试验准备
2
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6.3
试验条件
2
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6.4
光学模型
2
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6.5
测试过程
3
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6.6
平行试验
3
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7
试验结果分类
3
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8
试验报告
3
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附录A(规范性)
非晶碳基薄膜的光学性质分类方法
4
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Ⅰ
GB/T44538—2024
前言
本文件按照GB/T1.1—2020《标准化工作导则第1部分:标准化文件的结构和起草规则》的规
定起草。
本文件修改采用ISO23216:2021《碳基薄膜椭偏光谱法测定非晶态碳基薄膜的光学性能》。
本文件与ISO23216:2021相比做了下述结构调整:
—6.4和6.5对应ISO23216:2021中的6.4;
—6.6对应ISO23216:2021中的6.5。
本文件做了下列编辑性改动:
—增加了图1光学模型各层所对应类型的标注;
—增加了标题条(见5.1~5.7)。
请注意本文件的某些内容可能涉及专利。本文件的发布机构不承担识别专利的责任。
本文件由中国机械工业联合会提出。
本文件由全国金属与非金属覆盖层标准化技术委员会(SAC/TC57)归口。
本文件起草单位:中国机械总院集团武汉材料保护研究所有限公司、纳狮新材料有限公司、安徽纯
源镀膜科技有限公司、中国科学院深圳先进技术研究院、广东电网有限责任公司、广州今泰科技股份有
限公司。
本文件主要起草人:段海涛、贾丹、曹一莹、张心凤、沈学忠、高明、詹胜鹏、凃杰松、王彦峰、
王流火、杨田、陈辉、骆小双、尤锦鸿、易娟、苏东艺。
Ⅲ
GB/T44538—2024
碳基薄膜椭偏光谱法测定
非晶态碳基薄膜的光学性能
1范围
本文件描述了使用椭偏光谱法测定非晶碳基薄膜光学特性(折射率n和消光系数k)以及通过n﹘k图
谱进行不同类型非晶碳基薄膜分类的方法。
本文件适用于通过离子蒸镀、溅射、电弧沉积、等离子体辅助化学气相沉积、热丝等工艺沉积的非
晶碳基薄膜。
本文件不适用于通过金属或硅改性的非晶碳基薄膜,或在薄膜厚度上存在成分/性质梯度的非晶碳
基薄膜。
2规范性引用文件
本文件没有规范性引用文件。
3术语和定义
下列术语和定义适用于本文件。
3.1
折射率refractiveindex
n
电磁辐射在真空中的传播速度与在介质中的传播速度之比。
3.2
消光系数extinctioncoeicient
k
介质(物质)对电磁辐射的吸收量。
4试样制备
各基底上的非晶碳基薄膜均可用于试验,只要基底是光学各向同性的,并具有可用光学模型。推荐
的试验基底是镜面的硅晶片。镜面的硅晶片能作为非晶基碳膜的基底以满足不同的测试要求。样品应为
均匀的非晶碳基薄膜,薄膜厚度应为0.02μm~5μm。
应提供样品的所有相关细节,如尺寸、表面粗糙度、材料类型、成分、微观结构和处理过程等。
5设备
5.1卤素灯和蓝光LED灯
其光谱范围应包括450nm~950nm。
5.2探测器
用于获取椭偏仪测量数据,其光谱范围应包括450nm~950nm。
1
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